Ni doping and rational annealing boost thermoelectric performance of nanostructured double perovskite Pr1.8Sr0.2CoFeO6
Hao Wu,Xiao-Lei Shi,Wei-Di Liu,Han Gao,De-Zhuang Wang,Liang-Cao Yin,Qingfeng Liu,Zhi-Gang Chen
DOI: https://doi.org/10.1016/j.apmt.2022.101580
IF: 8.663
2022-12-01
Applied Materials Today
Abstract:Pr2CoFeO6-based double perovskite exhibits intrinsic low thermal conductivity and high Seebeck coefficient, but its low electrical conductivity induces unsatisfied thermoelectric performance. Here, we employ a synergistic strategy of rational annealing and Ni doping to achieve an improved ZT of ∼0.085 at 573 K in Pr1.8Sr0.2CoFe0.95Ni0.05O6, which is ∼425 % higher than that of pristine Pr2CoFeO6. The annealing process effectively reduces pores in the as-sintered bulk material, leading to an enhanced electrical conductivity without damaging the Seebeck coefficient, and the Ni doping further effectively improves the hole carrier concentration and in turn enhances the electrical conductivity, leading to a peak power factor of ∼113 μW m−1 K−2 at 573 K. Besides, Ni doping induces localized crystal imperfections including point defects, dislocations, and lattice distortions, contributing to an ultra-low thermal conductivity of <0.6 W m−1 K−1. As a result, the as-achieved Pr1.8Sr0.2CoFe0.95Ni0.05O6 has a ZT of ∼0.085 at 573 K, which is highly competitive to reported thermoelectric double perovskites, indicating its potential applications in high-performance thermoelectric devices.
materials science, multidisciplinary