Edge smoothing optimization method in DMD digital lithography system based on dynamic blur matching pixel overlap technique
Shengzhou Huang,Bowen Ren,Yuanzhuo Tang,Dongjie Wu,Jiani Pan,Zhaowei Tian,Chengwei Jiang,Zhi Li,Jinjin Huang
DOI: https://doi.org/10.1364/oe.514157
IF: 3.8
2024-01-06
Optics Express
Abstract:Shengzhou Huang, Bowen Ren, Yuanzhuo Tang, Dongjie Wu, Jiani Pan, Zhaowei Tian, Chengwei Jiang, Zhi Li, Jinjin Huang Due to digital micromirrors device (DMD) digital lithography limited by non-integer pixel errors, the edge smoothness of the exposed image ... [Opt. Express 32, 2114-2123 (2024)]
optics