P‐5.3: Design of Amorphous Silicon Thin‐Film Transistor Gate Driver Circuit with High Reliability and Narrow Border for Middle Size Liquid Crystal Display

Jhongciao Ke,Techen Chung,Chiate Liao,Chiamin Yu,Yanbing Qiao,Zhongfei Zou,Xiaojun Guo
DOI: https://doi.org/10.1002/sdtp.13626
2019-01-01
Abstract:In this paper, an integrated hydrogenated amorphous silicon (a‐Si: H) thin‐film transistor (TFT) gate driver circuit design with high reliability and the narrow border for middle size liquid crystal display is demonstrated. The circuit design with two sets of the low‐level holding unit can increase the reliability and suppress the threshold voltage (Vth) shift of TFT in the circuit. In addition, the low‐level holding unit is floating in the Q node pre‐charge period, ensuring that the low‐level holding unit can be efficiently turn off during the selected stage working. As a result, the circuit is very stable even at the TFT Vth shift of 3V in the high‐temperature operation.
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