Development of a Novel Temperature-Resistant and Salt-Resistant Double-Cationic Surfactant with ?super Thick Hydration Layer? for Clean Fracturing Fluid

Meng Cun,Jincheng Mao,HaiLin Sun,Guo Wei,Feng Tang,Wenlong Zhang,Jizhen Tian,Xiaojiang Yang,Chong Lin,ZiGao Huang
DOI: https://doi.org/10.1016/j.colsurfa.2021.126306
2021-01-01
Abstract:In recent years, cationic surfactants have received extensive attention in cleaning fracturing fluid thickeners due to various unique properties. At the same time, the development of temperature-resistant and salt-resistant clean fracturing fluid is the key to deep well oil and gas resource development. In this study, the rigid-soft combined strategy is adopted for molecular structure designs. N,N-dimethylcyclohexylamine and epichlorohydrin are used as the initial reactants; after the ring-opening reaction occurs, they are quaternized with erucamide propyl dimethyl ammonium to synthesize a novel double-cation viscoelastic surfactant, SY–JS. With double-cationic charges on the head group, water molecules are selectively adsorbed around the cation lattice to increase the hydration layer, and thus, salt tolerance is improved. Cyclohexane with a rigid structure improves temperature resistance. The ultra-long unsaturated hydrophobic tail imparts excellent heat tolerance and dissolubility to the designed viscoelastic surfactant. The clean fracturing fluid prepared by 3 wt% SY–JS with 130,000 ppm NaCl or KCl performs well under a shear rate of 170 s−1 at 140 °C, and the apparent viscosity remains above 30 mPa s−1 after 120 min.. Additionally, the results show that single-tail surfactants exhibit excellent performance at approximately 140 °C. Afterward, the brine produced from Rumaila and Jiyuan oil fields is used to prepare brine-based clean fracturing fluids, and evaluations, including proppant suspension, gel breaking, and permeability damage, were conducted. The results show that the brine-based clean fracturing fluid completely meets the requirements of hydraulic fracturing industrial application.
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