Improved Interface Characteristics of Mo/4H-SiC Schottky Contact

Ke-han Chen,Fei Cao,Zhao-yang Yang,Xing-ji Li,Jian-qun Yang,Ding-kun Shi,Ying Wang
DOI: https://doi.org/10.1016/j.sse.2021.108152
IF: 1.916
2021-01-01
Solid-State Electronics
Abstract:In this work, we studied different proportions of Mo-C alloy Schottky contacts. Compare the electrical characteristics and SiC interface with the Mo/4H-SiC based diodes. The Schottky interface obtained was studied at different annealing temperatures and its electrical properties were analyzed. Analyze electrical performance through temperature-related current-voltage (I-V) and capacitance-voltage (C-V) measurements. The experimental results showed that the metallic Mo-C alloy (9:1) Schottky contact had good stability and interface characteristics at high annealing temperatures. When annealing at 900 degrees C, its ideality factor approached 1 and the barrier height reached 1.04 eV. The TEM images also indicated that the Mo-C alloy reduced the solid-state reaction, which improved the inhomogeneity of the Schottky interface.
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