Investigation of Uniaxial Strain in Twisted Few-Layer MoS2

Weibin Zhang,Fanghua Cheng,Junwei Huang,Hongtao Yuan,Quan Wang
DOI: https://doi.org/10.1016/j.physleta.2021.127709
IF: 2.707
2021-01-01
Physics Letters A
Abstract:Applying strain is an effective way to change the optical properties of two-dimensional (2D) materials like molybdenum disulfide (MoS2). In this work, the technical details were provided to perform uniaxial strain measurements in the range of 0 similar to 5% in twisted monolayer-monolayer MoS2 (tMMM), twisted monolayerbilayer MoS2 (tMBM), twisted bilayer-monolayer MoS2 (tBMM) and twisted bilayer-bilayer MoS2 (tBBM). The redshift and splitting of the E-2g(1) peak in twisted few-layer MoS2 with increased strain are found by Raman spectroscopy and a Gruneisen parameter of similar to 1.31 is extracted. The decrease of optical band gap in MoS2 was measured by photoluminescence (PL) spectroscopy, and it changes approximately linear with strain, which is -16.27 meV/% strain for tMMM and -14.19 meV/% strain for tBBM. The intensity of A peak in PL spectra decreases to one third of its original value with an applied strain of similar to 5% for the twisted angle around 11 degrees. However, twisted few-layer MoS2 exhibits strain relaxation at higher strain. This relaxation causes the bandgap to cease further redshift. The findings in this paper can help to better understand the effects of strain on the optical properties in twisted few-layer MoS2, and is applicable to other 2D materials. (C) 2021 Elsevier B.V. All rights reserved.
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