Pressure Fluctuation Of 1/F(Alpha) In The Film Boiling Of Heii

P Zhang,M Murakami,Rz Wang
2002-01-01
Chinese Physics Letters
Abstract:A detailed study of the pressure oscillation induced by the film boiling of He II is presented. The film boiling state and the stability of the vapour film are determined by the governing parameter (i.e. the immersion depth). It is found that the power density spectrum of the pressure oscillation induced by the film boiling displays the 1/f(alpha)-behaviour. The exponent alpha was found to be within the range from one to two, which indicates the existence of self-organized criticality in the film boiling of He II.
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