Effect of swift heavy 86Kr<SUP>30+</SUP> ions irradiation on optical and electrical properties of p-type transparent Ni-doped CuAlO<sub>2</sub> films

Lingxiao Ma,Dayu Yin,Chenhao Dong,Wei Lan,Erqing Xie
DOI: https://doi.org/10.1007/s10854-019-02734-7
2020-01-01
Abstract:Swift heavy ion (SHI) irradiation is an effective approach to modulate the structure, optical and electrical properties of semiconductors. Herein, we present the influence of 86Kr(30+) ions irradiation on optical and electrical properties of p-type transparent oxide semiconductor Ni-doped CuAlO2 films prepared by sol-gel method. The results reveal that Ni-doping inhibits the amorphization of CuAlO2 films during swift heavy ions irradiation and decreases the surface roughness of SHI-irradiated Ni-doped CuAlO2 films. However, SHI-irradiated Ni-doped CuAlO2 films exhibit higher optical transmittance (74%) and lower electrical resistivity (11.5 omega cm), which corresponds to a decrease of two orders of magnitude due to the generation of a large number of carriers. In addition, SHI-irradiated Ni-doped CuAlO2 film renders photosensitive behavior and a reduced electrical resistivity of 7.4 omega cm is achieved under UV illumination. The superior optical and electrical properties of SHI-irradiated Ni-doped CuAlO2 films can be ascribed to the thermal spike effect of high-energy ions.
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