Design Of Photoelectric Detection System And Its Usage In Image Detection

Hui Li
DOI: https://doi.org/10.1166/jno.2020.2876
2020-01-01
Journal of Nanoelectronics and Optoelectronics
Abstract:In order to better detect the fabric defects, the optical detection technology is introduced in this study to emphasize the combination of image processing technology and spectral quantitative analysis technology, which helps to detect the fabric defects better. Based on this, the principle of ultraviolet light absorption is studied and the photoelectric detection system based on the optical detection technology is constructed, including optical path system, circuit amplification system, and single-chip system. The A/D module is simulated with the PROTUES software and the global system for mobile communications (GSM) communication system is introduced to monitor the defects in the fabric factory production process better. The fabric defects acquired by the photoelectric detection system were converted into digital images, and an improved texture periodicity defect analysis method is proposed to verify on the image processing platform MatLabR2007b. During the detection, images of fabric defects are acquired through the photoelectric detection system. The improved defect analysis algorithm is used to set the corresponding horizontal and vertical pixel values during the image processing. The results show that the calculation amount of image processing is significantly reduced, and the efficacy of preliminary image processing is greatly improved, thus, the structural information of defects is highlighted.
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