Preparation of hollow metal-organic frameworks <i>via</i> epitaxial protection and selective etching

Peican Chen,Jiawei Chen,Xuefu Hu,Cheng Wang
DOI: https://doi.org/10.1039/d1fd00016k
2021-01-01
Faraday Discussions
Abstract:Hollow metal-organic frameworks (MOFs) with only a shell may be used for efficient catalysis. In this work, a general sequential synthesis was employed to successfully create Hf-based hollow MOFs, such as UiO-66, MOF-808, and PCN-223. Etchants including monocarboxylic acids and H2O are required to remove the interior of the MOFs to form hollow structures, while the different stability of the interior and surface of the MOFs partly resulting from surface epitaxy protection was responsible for the selective etching. With these insights, scale-up of hollow octahedral UiO-66 was realized. This work paves a way to rationally design hollow MOFs.
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