Abstract:Generation of diverse VLSI layout patterns is crucial for various downstream tasks in design for manufacturing (DFM) studies. However, the lengthy design cycles often hinder the creation of a comprehensive layout pattern library, and new detrimental patterns may be discovered late in the product development process. Existing training-based ML pattern generation approaches struggle to produce legal layout patterns in the early stages of technology node development due to the limited availability of training <a class="link-external link-http" href="http://samples.To" rel="external noopener nofollow">this http URL</a> address this challenge, we propose PatternPaint, a training-free framework capable of generating legal patterns with limited DRC Clean training samples. PatternPaint simplifies complex layout pattern generation into a series of inpainting processes with a template-based denoising scheme. Our framework enables even a general pre-trained image foundation model (stable-diffusion), to generate valuable pattern variations, thereby enhancing the library. Notably, PatternPaint can operate with any input size. Furthermore, we explore fine-tuning a pre-trained model with VLSI layout images, resulting in a 2x generation efficiency compared to the base model. Our results show that the proposed model can generate legal patterns in complex 2D metal interconnect design rule settings and achieves a high diversity score. The designed system, with its flexible settings, supports pattern generation with localized changes and design rule violation correction. Validated on a sub-3nm technology node (Intel 18A), PatternPaint is the first framework to generate a complex 2D layout pattern library using only 20 design rule clean layout patterns as input.

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