Effects of H 2 O and O 2 Impurities on the Trichel Pulses Characteristics of the Negative Point-Plane Corona Discharge in SF 6

Qingqing Gao,Xiaohua Wang,Kazimierz Adamiak,Aijun Yang,Dingxin Liu,Chunping Niu,Jiawei Zhang
DOI: https://doi.org/10.1007/s11090-021-10166-7
2021-01-01
Plasma Chemistry and Plasma Processing
Abstract:The results of numerical simulation of the effects of H 2 O and O 2 impurities on the Trichel pulses characteristics in the negative point-plane corona discharge in SF 6 gas at 0.4 MPa is presented in this paper. The H 2 O and O 2 contents varied from 200 ppm to 10,000 ppm. The continuity equations for three charged species along with Poisson’s equation were solved simultaneously to obtain the Trichel pulses characteristics in SF 6 /H 2 O mixtures and SF 6 /O 2 mixtures. The reduced ionization coefficient, the reduced attachment coefficient, the electron mobility and the electron diffusion coefficient for SF 6 /H 2 O and SF 6 /O 2 mixtures were determined by solving the two-term Boltzmann equation. The effects of H 2 O and O 2 on the current pulses, the distributions of the charged species and the reduced electric field at the instants of the first and second peak pulse, the time-dependent total number of the three charged species in the gap and the reduced electric field at the discharge tip were investigated to determine the sensitivities of the Trichel pulses characteristics of the SF 6 to the H 2 O and O 2 impurities.
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