Unprecedented sulfenic acid-dependent hydroxyl radical production and DNA damage by N-heterocyclic thiols and H2O2
Li Mao,Zhi-Sheng Liu,Chun-Hua Huang,Tian-Shu Tang,Hao-Zhe Zhang,Shi-Yu Chen,Ben-Zhan Zhu
DOI: https://doi.org/10.1016/j.cej.2024.148731
IF: 15.1
2024-03-01
Chemical Engineering Journal
Abstract:The decomposition of H2O2 to produce the highly-reactive hydroxyl radical (•OH) is one of most well-known pathways to generate •OH, which can be readily activated by transition metal ions and haloquinones, but rarely by N-heterocyclic thiol compounds. Here we found, unexpectedly, that DNA oxidative damage can be induced by H2O2 together with 2-mercaptopyridine (PySH), a typical N-heterocyclic thiol compound widely-used in industry, agriculture, medicine and organic synthesis, which was found to be mainly due to production of •OH independent of transition metal ions. 2,2′-Dithiodipyridine, pyridine-2-sulfenic acid (PySOH), pyridine-2-sulfinic acid and pyridine-2-sulfonic acid were step-wisely produced during the reaction of PySH/H2O2, and the source and origin of the oxygen atoms inserted into these intermediates and products were found to be from H2O2 by oxygen-18 isotope labeling technique coupled with ESI-Q-TOF-MS analysis. More importantly, among all the transient intermediates, PySOH was found to be the key one directly responsible for •OH production from PySH/H2O2. Analogous results were observed with several PySH derivatives. This is the first report on an unprecedented sulfenic acid-dependent •OH production from the activation of H2O2 by N-heterocyclic thiol compounds, which may have important chemical, biological and biomedical implications for future study of these widely-used compounds.
engineering, chemical, environmental