Recent advancements in poly-Si/SiOx passivating contacts for high-efficiency silicon solar cells: Technology review and perspectives
Jiakai Zhou,Xianglin Su,Qian Huang,Bike Zhang,Jie Yang,Ying Zhao,Guofu Hou
DOI: https://doi.org/10.1039/d2ta04730f
IF: 11.9
2022-08-26
Journal of Materials Chemistry A
Abstract:Even as photovoltaics (PV) made out of crystalline silicon (c-Si) become more commonplace, the past decade has witnessed leaps and bounds in performance advances, the majority of which have been focused on lowering the losses associated with the directly metallized, heavily doped areas seen in typical devices. There are a number of recent developments that have the potential to greatly enhance the efficiency of commercially available thin-film c-Si solar cells, including passivating contact technique featuring stack of polysilicon (poly-Si)/SiOx, commonly abbreviated as TOPCon (tunnel oxide passivated contacts), which has realized efficiencies over 26% and 24% for lab and industrial cells, respectively. The paper provides an outline of the evolution history of this structure that dates back to the 1980s, as well as a description of the present status in lab and industry. While the future of poly-Si junctions seems to be bright, as predicted by the International Technology Roadmap of Photovoltaics, various difficulties remain unresolved, such as the poly-Si preparation and the metallization issues. Additionally, this review discusses the remaining hurdles and the promise for poly-Si junctions to revolutionize the PV industry.
materials science, multidisciplinary,chemistry, physical,energy & fuels