In situ experimental set-up for probing electrical characteristics of nanoscale vacuum gaps based on the FIB-SEM dual-beam system
Guo-dong MENG,Cheng-ye DONG,Chuang MEN,Yong-hong CHENG
DOI: https://doi.org/10.3969/j.issn.1000-6281.2016.06.010
2016-01-01
Abstract:The research on the breakdown characteristics and insulation properties at nanoscale is on the cutting edge of the high voltage and insulation field. On the one hand, the feature size of the electrical component and electronic devices has been scaled down to micrometer, nanometer and even atomic size as the rapid development of micromachining technique, which has extensive applications in military and civil fields. On the other hand, the explanation and prediction for the breakdown and insulation properties at micro and nanoscale can not be performed through the classic breakdown theory and assessment method. Hence, based on the FIB-SEM dual-beam system, an in situ experimental system for nanoscale gap breakdown in vacuum by the piezoelectric displacement and the weak current measurement techniques has been set up. Using this system, the in situ fabrication of micro and nanoscale ( with the radius from 15 nm to 10 μm) electrodes, quantitative analysis of material compositions as well as the experimental investigation on the breakdown chrematistics of nanoscale vacuum gap can be achieved. The study is believed to pave the way to the experimental study of breakdown characteristics and insulation properties at nanoscale.
What problem does this paper attempt to address?