DOSE EFFECT OF N+ AND Ar+ IMPLANTATION INTO THYMINE AND URACIL

WANG Wei-dong,LIU Lei-an,XUE Jian-ming,ZHANG Lings-huai,QIN Guang-yong,LAI Jiang-nan,LIN Shu,WANG Yu-gang,WEI Xiong-hui
DOI: https://doi.org/10.3969/j.issn.1000-8551.2005.01.013
2005-01-01
Abstract:The dose-effect of the implantation of N+ and Ar+ on thymine and uracil were studied in this paper. Simulative curves were given when the sputtering of the intact sample molecules and the decomposition of the sample were taken into account. The simulative curves were fit for dose-effect curves when the sputtering and damage parameters change. It was also found that thymine and uracil had different sensitivities to N+ and Ar+.=
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