Portrait Skin Beautification Technology Using Multiple Feature Masks

LU Xiao-hui,WANG Jin,LU Guo-dong,ZHANG Dong-liang
DOI: https://doi.org/10.3785/j.issn.1008-973x.2017.12.001
2017-01-01
Abstract:Portrait skin beautification technology using multiple feature masks was proposed to solve detail blurring and character losing problem in existing portrait skin beautification technologies.The first mask was called facial apparent blemish feature mask.This mask was made up of high pass and superposition of hard light,which was used for removing apparent facial blemishes beforehand.The second mask called portrait background feature mask was made up of skin color detection.The third mask called facial key feature mask was made up of Face+[algorithm.The second mask along with the third mask can help to solve the problem that filtering may blur facial key features and portrait background features.The fourth mask called stereo vision control mask was made up of high pass.This mask can restore facial stereo vision features after portrait skin beautification.Experimental results show that this method could wipe off facial blemishes by setting a smaller portrait skin beautification coefficient and retain realistic features,such as facial key features,as well as facial stereoscopic effect with a larger portrait skin beautification coefficient.Therefore,the contradictory problem that portrait skin beautification should either keep the clarity of details or keep the degree of removing facial blemishes was solved.This technology can achieve the purpose of facial beautification.
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