Degassing Behavior of Vacuum Electronic Materials Bombarded by Electron Beam

Yanwen Liu,Hong Tian,Hong Zhu,Mingfeng Meng,Li Zhao,fen Li,Bing Gu
DOI: https://doi.org/10.13922/j.cnki.cjovst.2017.04.04
2017-01-01
Abstract:The impact of the electron bombardmenton degassing behavior of vacuum electronics materials was investigated and exemplified withoxygen-free copper.The outgassing rate was precisely measured in orifice conductance method with the lab-built test-platform at a base pressure of 5.0×10-7 Pa.The results show that the degassing rate of O-free Cu was linearly proportional to the voltage,width and frequency of the pulsed electron beam.The chemi-sorbed single atoms dominated the bombarded Cu-surface after exposure to air for 150h,possibly because of the surface charge accumulation;and the previous lowest outgassing-rate was rapidly reached after removal of the chemisorbed species by electron bombardment.The desorbed gases were identified as H2,H2O,N2 and CO2.We suggest that the reliability and service lifetime of microwave vacuum devices may be significantly improved by degassing the anodes and/or collectors with the electron beam emitted from hot-cathode and/or electron guns.
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