Abstract:The extreme ultraviolet (EUV) emission characteristics from Sn plasma for lithography produced by a pulse discharge CO2 laser was investigated under different conditions. Extreme ultraviolet spectral measurements were made throughout the wavelength region of 6.5 nm to 16.8 nm using a grazing incidence flat-field spectrograph coupled with an X-ray charge-coupled device camera for detection of time-integrated spectra. The dependence of spectral properties of the EUV emission on pulse duration, incidence pulse energy, and buffer gas pressure was investigated. The results show that the peak of EUV spectra was located at 13.5 nm. The intensity of EUV emission increased with increasing laser energy ranging from 30 mJ to 600 mJ in a nonlinear manner with saturation effect. The critical energy of incident pulse laser for the generation of EUV emission is near 30 mJ in our experiment. The highest conversion efficiency of 1.2% in producing 13.5 nm EUV light with 0.27 nm bandwidth was achieved at pump energy of 425 mJ. The EUV spectra from a plate target produced by laser pulse with full width at half maximum range from 50 ns to 120 ns were recorded and negligible differences in their spectral features noticed even though higher spectral intensity was observed by shorter pulse duration. The 2% in-band EUV intensity with 52 ns pulse duration was 1.6 times higher than that with 120 ns pulse duration due to the increase in laser intensity. It was also found that the detected EUV spectral intensity rapidly decreased with increasing buffer air pressure, and the EUV emission could be totally absorbed at the pressure of 200 Pa, while weak EUV emission could be still detected at the buffer He gas pressure of 7 X 10(4) Pa. The experimental results showed that the absorption coefficient of 13.5 nm light at air buffer gas pressure of 100 Pa was 3.0 m(-1), while the absorption coefficient was 0.96 m(-1) at the same He buffer gas pressure.

Numerical Simulation of Pulsed CO2 Laser Produced Tin Plasma

Influence of CO2-laser pulse parameters on 13.5 nm extreme ultraviolet emission features from irradiated liquid tin target

Extreme Ultraviolet and Visible Emission Spectroscopic Characterization of CO2 Laser Produced Tin Plasma for Lithography

Time and Space Resolved Visible Spectroscopic Imaging Co2 Laser Produced Extreme Ultraviolet Emitting Tin Plasmas

Experimental Study on the Temporal Evolution Parameters of Laser–Produced Tin Plasma under Different Laser Pulse Energies for LPP–EUV Source

Characteristics of Extreme Ultraviolet Emission from Tin Plasma Using Co2 Laser for Lithography

Spectral Efficiency of Extreme Ultraviolet Emission from Co2 Laser-Produced Tin Plasma Using A Grazing Incidence Flat-Field Spectrograph

The numerical simulation of melting and evaporation due to ultrashort pulse laser irradiation

Influence of Pre-Ionized Plasma on the Dynamics of a Tin Laser-Triggered Discharge-Plasma

Numerical Study on the Terminating Mechanisms of Copper Vapor Laser Pulse

Simulation of High Power Thz Emission from Laser Interaction with Tenuous Plasma and Gas Targets

Ion distribution and ablation depth measurements of a fs-ps laser-irradiated solid tin target

Characterization of angularly resolved EUV emission from 2-$μ$m-wavelength laser-driven Sn plasmas using preformed liquid disk targets

High Quality Electron Bunch Generation with CO2-laser-plasma Interaction

Numerical Simulation of Thin Foils Irradiated by Ultrashort Pulse Laser

Numerical simulation of copper ablation by ultrashort laser pulses

Simulation of expansion of aluminum plasmas produced by a small focal spot nanosecond laser irradiation

Numerical Simulation for Influence of Pulse Duration on Femtosecond Laser Ablation of Alloy

Simulation of Laser Interaction with Ablative Plasma and Hydrodynamic Behavior of Laser Supported Plasma

Vaporization effect studying on high-power nanosecond pulsed laser deposition

Study on Ultra-Short Laser Pulse Ablation of Metals by Molecular Dynamics Simulation