Robust PLS and Its Application to Batch Process Monitoring

XIE Lei,WANG Shuqing,Zhang Jianming
DOI: https://doi.org/10.3321/j.issn:0438-1157.2005.03.022
2005-01-01
Abstract:Batch and semi-batch processes play an important role in chemical industry. In order to reduce the variations of the product quality, multivariate statistical process control methods based on multi-way partial least squares (MPLS) is proposed for on-line batch process monitoring. However outliers always exist in the data, traditional MPLS methods are strongly affected by outlying observations. A batch process monitoring method based on robust MPLS is proposed. The robust normal operating condition model and robust control limits are discussed in detail. The results show that the robust MPLS is resistant to possible outliers.
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