Microstructure and oxidation behavior of Si-MoSi2 coating deposited on Mo substrate at 600 °C and 900 °C in static air
Tao Fu,Yingyi Zhang,Fuqiang Shen,Kunkun Cui,Luyu Chen,Tao Fu,Yingyi Zhang,Fuqiang Shen,Kunkun Cui,Luyu Chen
DOI: https://doi.org/10.1016/j.matchar.2022.112192
IF: 4.537
2022-10-01
Materials Characterization
Abstract:Si-MoSi2 oxidation protective coating was produced on Mo surface by hot dip silicon-plating (HDS) technology. The isothermal oxidation behavior of Si-MoSi2 coating was investigated in air at at 600 °C and 900 °C. The results indicate that the coating consists of Mo5Si3 interface layer, MoSi2 intermediate layer and Si outer layer. The coating surface is smooth and compact, and the average surface roughness (RSa) is only 0.275 μm. The oxidation test results show that the thickness of oxide layer of the coating increases to 17–20 μm, and the weight gain (Δ m/S) of the coating is 3.48 mg/cm2 after exposed at 600 °C for 150 h. After oxidation at 900 °C for 40 h, the Δ m/S and oxide layer thicknesses are only 0.085 mg/cm2 and 6 μm, respectively. The excellent low-temperature oxidation resistance of Si-MoSi2 coating is mainly attributed to its uniform composition, compact structure, high surface silicon content and extremely low surface roughness.
materials science, multidisciplinary,metallurgy & metallurgical engineering, characterization & testing