High-Throughput Measurement of the Contact Resistance of Metal Electrode Materials and Uncertainty Estimation

Chao Zhang,Wanbin Ren
DOI: https://doi.org/10.3390/electronics9122079
IF: 2.9
2020-01-01
Electronics
Abstract:Low and stable contact resistance of metal electrode materials is mainly demanded for reliable and long lifetime electrical engineering. A novel test rig is developed in order to realize the high-throughput measurement of the contact resistance with the adjustable mechanical load force and load current. The contact potential drop is extracted accurately based on the proposed periodical current chopping (PCC) method in addition to the sliding window average filtering algorithm. The instrument is calibrated by standard resistors of 1 mΩ, 10 mΩ, and 100 mΩ with the accuracy of 0.01% and the associated measurement uncertainty is evaluated systematically. Furthermore, the contact resistance between standard indenter and rivet specimen is measured by the commercial DMM-based instruments and our designed test rig for comparison. The variations in relative expanded uncertainty of the measured contact resistance as a function of various mechanical load force and load current are presented.
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