High energy density and high efficiency achieved in the Ca_0.74Sr_0.26Zr_0.7Ti_0.3O₃ linear dielectric thin films on the silicon substrates

Xiaoyang Chen,Binbin Huang,Yun Liu,Wenwu Wang,Ping Yu

DOI: https://doi.org/10.1063/5.0024307

IF: 4

2020-01-01

Applied Physics Letters

Abstract:Linear dielectrics are promising candidates for high-performance energy storage applications with high efficiency, excellent thermal stability, and high reliability due to their low loss, high dielectric breakdown strength, and stable dielectric properties, which are independent of the electric field and temperature. However, their low dielectric constant or polarization restricts the stored electrical energy, which makes them less attractive for high energy density storage applications compared to relaxor ferroelectrics or anti-ferroelectrics. Here, we realized an ultrahigh energy density (U-e similar to 59.4J/cm(3)) and high efficiency (similar to 89%) simultaneously in the Ca0.74Sr0.26Zr0.7Ti0.3O3 (CSZT) linear dielectric thin film, which are competitive with those of other lead-based and lead-free dielectric films deposited on Si wafers. Moreover, the CSZT thin-film capacitor exhibits great thermal stability with the U-e variation less than 3% from -90 degrees C to 170 degrees C and good fatigue endurance with the U-e variation of 4.5% after 3x10(7) cycles at 10kHz. This work also reveals that the exploration of advanced linear dielectric thin films with a medium dielectric constant would benefit from the development of high-performance energy-storage capacitors.