Effect of Hf doping content on the structure, optical and electrical properties of flexible Hf<i><sub>x</sub></i>Zn<sub>1-<i>x</i></sub>O thin films by sol-gel method
Qianwen Peng,Libing Duan,Hao Shen,Di Wang,Cong Han,Yanfen Niu,Xiaoru Zhao
DOI: https://doi.org/10.1016/j.mssp.2020.105383
IF: 4.1
2021-01-01
Materials Science in Semiconductor Processing
Abstract:Transparent and conducting HfxZn1-xO thin films with nominal Hf doping concentration (x = 0-7%) were suc-cessfully synthesized on flexible polyimide (PI) substrates by the sol-gel spin coating method. All films showed hexagonal wurtzite structure of ZnO with preferred orientation of c-axis after air and vacuum annealing. The minimum resistivity reached to as low as 6.3 x 10(-2) Omega cm after annealed in vacuum atmosphere with 3% Hf content. The carrier concentration increased from 10(18) cm(-3) to 10(19) cm(-3), while Hall mobility decreased from 23 cm(2)v(-1)s(-1) to 3 cm(2)v(-1)s(-1) with increasing Hf concentration. According to the SEM and XPS analysis, for x = 0-3%, grain boundary scattering was the major factor of mobility, while for x = 5-7%, besides the grain boundary scattering, ionized impurity and natural scattering also play a crucial role in the variation of mobility. The minimum resistivity was due to the competition of increasing carrier concentration and decreasing mobility.
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