The Interaction of Oxygen with the Alpha-U(001) Surface: an Ab Initio Study

J. L. Nie,L. Ao,X. T. Zu,H. Huang,K. Z. Liu
DOI: https://doi.org/10.1088/0031-8949/89/7/075701
2014-01-01
Physica Scripta
Abstract:First-principles calculations based on density functional theory have been performed to investigate the adsorption, dissociation and diffusion of oxygen on the alpha-Uranium(001) surface. The results showed that O-2 tends to dissociate followed by the occupation of the two adjacent three-fold hollow sites. The weak molecular adsorption was found for O-2 adsorbed perpendicularly at the top of a uranium (U) atom. The investigation of the dissociation for O-2 from the top site with the O atoms falling into the two adjacent hollow sites indicated the spontaneous dissociation of O-2. The surface diffusion of atomic oxygen between two adjacent hollow sites encountered an activation barrier of 0.55 eV, indicating the slow motion for O on the alpha-U(001) surface.
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