A new methodology of integrating high level synthesis and floorplanning for nanometer regime design

YF Wang,JI Bian,XL Hong
2005-01-01
Abstract:As silicon CMOS technology is scaled into the nanometer regime, the computer aided design technology is challenged by two major feature: the ever-increasing design complexity of gigascale integration and complicated physical effects inherent from the nanoscale technology[l]. The functional complexity is managed by system level design methodologies and the nanometer physical effects are managed by manufacture-aware design techniques. Because these two challenges are combined closely, the cooperation between high level abstraction of a circuit and physical layout has to be engaged. In this paper, a new methodology which cooperate the higher level abstraction of design (high level synthesis) and basic manufacture aware design phase (floorplanning) together is presented.
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