Collisional Quenching of Electronically Excited Ch Radicals by Ar, No and Chbr3 Molecules

Chen Congxian,Ran Qin,Yn Shuqin,Ma Xingxiao
DOI: https://doi.org/10.3866/pku.whxb19940415
1994-01-01
Abstract:The collisional quenching rate constants of CH(A, nu'=0) by Ar and CHBr3 and CH(A, B, nu'=0) by NO molecule were measured by means of laser photolysis of CHBr3 molecule at 266 nm generating CH(A, B) radicals and monitoring the time resolved signal of emission. CH(A, B -> X). The dependence of quenching rate constant of CH(A, nu'=0) by CHBr3 on rotational state of CH(A) is presented. It is found that the quenching rate decreases with increasing rotational quantum number of CH(A).
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