Pressure–temperature Stability of the Van Der Waals Compound (H2)4CH4

Wendy L. Mao,Viktor V. Struzhkin,Ho-kwang Mao,Russell J. Hemley
DOI: https://doi.org/10.1016/j.cplett.2004.11.133
IF: 2.719
2005-01-01
Chemical Physics Letters
Abstract:The melting curve of (H2)4CH4, an extremely hydrogen-rich compound in the hydrogen–methane system, was determined using optical microscopy and Raman spectroscopy at high pressure (6 GPa) and low temperature (10 K) in a diamond anvil cell. The experimental data was fit with a Simon–Glatzel equation: P (GPa)=2.67×10−3T (K)1.36−0.771. The high hydrogen content (50.2 wt% including the hydrogen in methane, 33.4 wt% only considering the molecular hydrogen) makes this material of interest for hydrogen fuel storage. We found that (H2)4CH4 can be quenched to ambient helium pressure of 1 atm at 10 K and decomposes at approximately 23 K.
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