Rapid Pressureless and Low-Temperature Bonding of Large-Area Power Chips by Sintering Two-Step Activated Ag Paste
Hui Fang,Chenxi Wang,Shicheng Zhou,Qiushi Kang,Te Wang,Dongsheng Yang,Yanhong Tian,Tadatomo Suga
DOI: https://doi.org/10.1007/s10854-020-03207-y
2020-01-01
Journal of Materials Science Materials in Electronics
Abstract:Pressureless and low-temperature sintering of Ag paste has been mentioned as a promising strategy to solve the poor performance of large-area chips. In this paper, we develop a two-step surface activation process to achieve rapid pressureless and low-temperature bonding of Cu in air using a micron-scale Ag paste for large-area chips. The organics that adsorb on the Ag particles are initially removed by oxygen plasma cleaning, and the silver oxide byproducts are subsequently deoxidized by a methanol/hydroxide mixed vapor treatment. The two-step activation significantly improves the sinterability of the micron-scale Ag paste, leading to excellent interfacial properties after rapid sintering at 200 °C for only 10 min in air. Robust-bonded joints are achieved with a shear strength and thermal conductivity that are four times higher than those of the non-activated bonded joints. The bonding strength and thermal conductivity of the Cu joint structure are approximately 25 MPa and 96 W/mK, respectively, which are superior to those of traditional Sn–Pb solders. Void-free bonding interfaces are confirmed by large-area chips even without pressure in air; this method shows great potential for the cost-effective commercial packaging of power electronics.
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