The Material Efforts for Quantized Hall Devices Based on Topological Insulators

Fucong Fei,Shuai Zhang,Minhao Zhang,Syed Adil Shah,Fengqi Song,Xuefeng Wang,Baigeng Wang
DOI: https://doi.org/10.1002/adma.201904593
IF: 29.4
2020-01-01
Advanced Materials
Abstract:A topological insulator (TI) is a kind of novel material hosting a topological band structure and plenty of exotic topological quantum effects. Achieving quantized electrical transport, including the quantum Hall effect (QHE) and the quantum anomalous Hall effect (QAHE), is an important aspect of realizing quantum devices based on TI materials. Intense efforts are made in this field, in which the most essential research is based on the optimization of realistic TI materials. Herein, the TI material development process is reviewed, focusing on the realization of quantized transport. Especially, for QHE, the strategies to increase the surface transport ratio and decrease the threshold magnetic field of QHE are examined. For QAHE, the evolution history of magnetic TIs is introduced, and the recently discovered magnetic TI candidates with intrinsic magnetizations are discussed in detail. Moreover, future research perspectives on these novel topological quantum effects are also evaluated.
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