Linear Aging Behavior at Short Timescales in Nanoscale Contacts.

Kaiwen Tian,Zhuohan Li,Yun Liu,Nitya N. Gosvami,David L. Goldsby,Izabela Szlufarska,Robert W. Carpick
DOI: https://doi.org/10.1103/physrevlett.124.026801
IF: 8.6
2020-01-01
Physical Review Letters
Abstract:Nanoscale silica-silica contacts were recently found to exhibit logarithmic aging for times ranging from 0.1 to 100 s, consistent with the macroscopic rate and state friction laws and several other aging processes. Nanoscale aging in this system is attributed to progressive formation of interfacial siloxane bonds between surface silanol groups. However, understanding or even data for contact behavior for aging times <0.1 s, before the onset of logarithmic aging, is limited. Using a combination of atomic force microscopy experiments and kinetic Monte Carlo simulations, we find that aging is nearly linear with aging time at short timescales between similar to 5 and 90 ms. We demonstrate that aging at these timescales requires the existence of a particular range of reaction energy barriers for interfacial bonding. Specifically, linear aging behavior consistent with experiments requires a narrow peak close to the upper bound of this range of barriers. These new insights into the reaction kinetics of interfacial bonding in nanoscale aging advance the development of physically based rate and state friction laws for nanoscale contacts.
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