Efficient removal of low-concentration organoarsenic by Zr-based metal-organic frameworks: Cooperation of defects and hydrogen bonds

Yunyun Xu,Jia-Xin Lv,Yao Song,Xiaoyu Zhou,Tian Chen,Xu-Jia Hong,Yuepeng Cai,Cunyuan Zhao,Zhang Lin
DOI: https://doi.org/10.1039/c9en00923j
2019-01-01
Abstract:As an emerging micropollutant, organoarsenic has caused global ecosystem pollution, due to its degradation to highly toxic inorganic arsenic in the environment. Therefore, to remove the low-concentration organoarsenic from arsenic compounds from water, materials with high adsorption affinity are in urgent need. Herein, we reported an amino-modified metal-organic framework (MOF) with defects (UiO-66-D-NH2) to adsorb two typical organoarsenic forms p-arsanilic acid (p-ASA) and roxarsone (ROX). The adsorption affinity of UiO-66-D-NH2 was 3.8 and 3.0 times higher than that of original UiO-66 and defective UiO-66 without amino modification (UiO-66-D), while the removal rate exceeded 99.1% when the initial concentration of organoarsenic decreased to 1 mg L-1. UiO-66-D-NH2 also showed excellent adsorption behavior in simulated wastewater, with residual arsenic concentrations lower than 0.54 mu g L-1. Mechanism studies showed a cooperation of the defects and -NH2 groups in UiO-66-D-NH2. The defects provided more Zr-OH sites in the metal node, leading to transformation of the As-O-Zr coordination from monodentate mononuclear to bidentate binuclear configuration, while -NH2 groups formed hydrogen bonds with both p-ASA and ROX as a secondary interaction to further reinforce the as-formed As-O-Zr complex. This work revealed that making cooperation by defect creation and amino modification could be an effective method to enhance the adsorption affinity of MOFs to low-concentration organoarsenic.
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