In-situ homodispersely immobilization of Ag@AgCl on chloridized g-C3N4 nanosheets as an ultrastable plasmonic photocatalyst

Di Sun,Yang Zhang,Yanfei Liu,Zegao Wang,Xiaochen Chen,Zheying Meng,Shifei Kang,Yuanyi Zheng,Lifeng Cui,Menglin Chen,Mingdong Dong,Bing Hu
DOI: https://doi.org/10.1016/j.cej.2019.123259
IF: 15.1
2020-01-01
Chemical Engineering Journal
Abstract:•In-situ implanting approach for ultrastable and high-performance plasmonic photocatalyst was developed.•The prefixed Cl sites play a critical role in the ideal dispersion and immobilization of Ag species.•The excellent stability was verified by the minimized Ag leakage and electrochemical anti-corrosion current and voltage.•This in-situ implanting design affords great potential of the plasmonic photocatalysts in practical applications.
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