Machine learning aided solution to the inverse problem in optical scatterometry
Shuo Liu,Xiuguo Chen,Tianjuan Yang,Chunfu Guo,Jiahao Zhang,Jianyuan Ma,Chao Chen,Cai Wang,Chuanwei Zhang,Shiyuan Liu
DOI: https://doi.org/10.1016/j.measurement.2022.110811
IF: 5.6
2022-03-01
Measurement
Abstract:Optical scatterometry is the workhorse technique for in-line manufacturing process control in the semiconductor industry. However, as manufacturing processes develop, traditional methods for solving the inverse problem in optical scatterometry are struggling to continue improving productivity. To address this problem, machine learning can be a promising method, but it is a challenge to ensure robustness. In this paper, we propose a machine learning method to reconstruct the profile of nanostructures. The proposed method consists of three parts: compressing signature using a dimensionality reduction approach based on the principle component analysis, constructing a surrogate electromagnetic solver (SurEM) based on an artificial neural network mapping from parameters to signatures, and iteratively comparing the SurEM-predicted signatures with measured one to finally determine the results. Experiments have demonstrated that the proposed method can achieve fast and accurate measurement. This method is thus promising as an efficient in-line measurement method for nano- or micro-scale manufacturing.
engineering, multidisciplinary,instruments & instrumentation