Enhancement of Discharge and Deposition Rate in Dual-Pulse Pulsed Magnetron Sputtering: Effect of Ignition Pulse Width

Houpu Wu,Qinwen Tian,Xiubo Tian,Chunzhi Gong,Xinyu Zhang,Zhongzhen Wu
DOI: https://doi.org/10.1016/j.surfcoat.2019.06.016
2019-01-01
Abstract:To increase deposition rate during pulsed magnetron sputtering (PMS), a novel dual-pulse pulsed magnetron sputtering (DP-PMS) was proposed. The discharge mode of DP-PMS firstly produced a pulsed high ignition voltage with short duration followed by a subsequent pulsed low work voltage with long duration. CrN coatings were deposited by DP-PMS and PMS. The effect of ignition pulse width of DP-PMS on the discharge of Cr target in argon and the deposition rate of CrN coatings was explored. The target current of DP-PMS was featured by an initial peak, which was different from the triangular waveform in PMS. The DP-PMS with a longer ignition pulse produced a higher substrate current and a larger number of Cr0 at unit target power. There existed a proper width of initial ignition pulse (e.g. 15 us) producing the maximum deposition rate at unit target power, which was nearly four times higher than that of PMS.
What problem does this paper attempt to address?