Tuning the Doping Ratio and Phase Transition Temperature of VO 2 Thin Film by Dual-Target Co-Sputtering.

Xu Chen,Mingfei Wu,Xingxing Liu,Ding Wang,Feng Liu,Yuwei Chen,Fei Yi,Wanxia Huang,Shaowei Wang

DOI: https://doi.org/10.3390/nano9060834

2019-01-01

Abstract:A new simple way for tuning the phase transition temperature (PTT) of VO thin films has been proposed to solve the problem of changing the doping ratio by using the dual-target co-sputtering method. A series of samples with W doping ratios of 0%, 0.5%, 1%, 1.5% and 2% have been fabricated by sputtering V films with the power of pure and 2% W-doped V targets from 500 W: 0 W, 500 W: 250 W, 500 W: 500 W, 250 W: 500 W to 0 W: 500 W respectively and then annealed in an oxygen atmosphere to form VO. The XRD results of both pure and W-doped VO samples reveal that VO forms and is the main component after annealing. The PTT can be tuned by controlling the sputtering power ratio of the pure and doped targets. It can be tuned easily from 64.3 °C to 36.5 °C by using the pure and 2% W-doped targets for demonstration, with W doping ratios from 0% to 2%. It is also valid for other doping elements and is a promising approach for the large-scale production of sputtering.