Room-temperature Electrochemical Deposition of Ultrathin CuOx Film As Hole Transport Layer for Perovskite Solar Cells

Xu Miao,Shuo Wang,Wenhai Sun,Yu Zhu,Chen Du,Ruixin Ma,Chengyan Wang
DOI: https://doi.org/10.1016/j.scriptamat.2019.02.032
IF: 6.302
2019-01-01
Scripta Materialia
Abstract:CuOx has attracted more attention as a hole transport material. Electrochemical deposition is a simple and efficient coating method, which avoids high temperature process, complicated operation and avoided material waste during coating process. The ultrathin CuOx films were fabricated in CuSO4 and lactic acid mixed liquids through a simple electrochemical deposition method. The CuOx thin films prepared at pH = 9 showed the best conductivity and light transmittance. After the optimization of the devices, the performance of the device shows a best power conversion efficiency (PCE) of 13.48% under standard AM 1.5G simulated solar irradiation with a shadow mask of 0.1cm(2) and remained over 75% PCE after storing for 500 h. (C) 2019 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
What problem does this paper attempt to address?