An Ultra-Dense 2fefet TCAM Design Based on a Multi-Domain FeFET Model

Xunzhao Yin,Kai Ni,Dayane Reis,Suman Datta,Michael Niemier,Xiaobo Sharon Hu
DOI: https://doi.org/10.1109/tcsii.2018.2889225
2019-01-01
Abstract:Ternary content addressable memories (TCAMs) represent a form of logic-in-memory and are currently widely used in routers, caches, and efficient machine learning models. From a technology prospective, researchers have begun to consider various non-volatile (NV) memory technologies to design NV TCAMs that may offer improvements with respect to figures of merit, such as energy and delay when compared to conventional CMOS designs. Among these devices, ferroelectric field effect transistors (FeFETs) stand out due to their high I-ON/I-OFF ratio, efficient voltage-driven write mechanism, low-cost, and CMOS-compatible fabrication process. We propose a 2FeFET TCAM design based on a state-of-the-art, experimentally calibrated FeFET model. We evaluate and compare our design with other TCAMs at the cell and array levels. Our results suggest that a 2FeFET TCAM requires 3.5x/3200x less write energy than CMOS/resistive random access memory (ReRAM) TCAMs, respectively. The cell area is 13% of that of a CMOS TCAM, and is on par with ReRAM designs. The search energy-delay-product of a 2FeFET TCAM is also 4.1x/2.8x less than CMOS/ReRAM TCAMs, respectively.
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