Self-Modulating Interfacial Cation Migration Induced Threshold Switching In Bilayer Oxide Memristive Device

Jun Yin,Fei Zeng,Qin Wan,Yiming Sun,Yuandong Hu,Jialu Liu,Guoqi Li,Feng Pan
DOI: https://doi.org/10.1021/acs.jpcc.8b09793
2019-01-01
Abstract:A selector device based on threshold switching is a potential candidate for preventing leaky current from nearby units in cross-point memristor arrays during operation, which is required for low-cost operation and good reliability. A simple selector structure, i.e., Ag/HfOy/HfOx/Pt (AHHP), was constructed in this work. The device exhibits electroforming-free properties, a low threshold switching voltage of similar to 0.28 V, a wide range of operating current from 1 nA to 300 mu A, and an extremely sharp switching slope of similar to 0.6 mV/dec. Both selector and memristor can be achieved by simple and compatible technology in comparison with a memristor structure of Ag/HfOx/Pt. In light of the detailed microstructure characteristics, a coupling mechanism between crystallite kinetics and activated Ag atom migration in the electrolyte is presented and discussed in detail. Stress-assisted crystallite rotation of hafnium oxide in AHHP interferes with the bonding and evolution feature of Ag conductive filaments and then induces selective effects during threshold switching. We also demonstrate the AHHP device can serve for logic circuit functions and expect the feasibility of the device for fabricating integrated array unit. The results suggest a new mechanism of threshold switching potential for application in memristor array.
What problem does this paper attempt to address?