Modeling of CuCr Contact Vacuum Arc with Different Species

Jie Deng,Lijun Wang,Xiao Zhang,Ze Yang,Shenli Jia

DOI: https://doi.org/10.1109/deiv.2018.8537057

2018-01-01

Abstract:This paper involves the simulation of vacuum arc under composite contact. A three dimensional model is developed and we consider the ionization process in the vacuum arc. The species transport equations, in which the fraction of each species is calculated, provides the distribution of various atoms and ions in vacuum arc. The model describes ions and atoms as two different processes considering that ions are influenced by self-generated magnetic field. Atoms play an inferior role in the vacuum arc plasma process. They gather in an ‘atom layer’ whose thickness is a tenth of contact gap. Furthermore, the distribution of ion species is closely related to the degree of ionization. At cathode, singly charged ions are dominant. From cathode to anode, ions are ionized so that doubly particles become a major component at anode. Finally, atom calculation enables the accomplishment to combine atom with ion behavior together. Distributions of species are available by species transport equations, providing the fraction of species.