Atomic Layer Deposition-Developed Two-Dimensional Α-Moo3 Windows Excellent Hydrogen Peroxide Electrochemical Sensing Capabilities

Zihan Wei,Zhenyin Hai,Mohammad Karbalaei Akbari,Dongchen Qi,Kaijian Xing,Qing Zhao,Francis Verpoort,Jie Hu,Lachlan Hyde,Serge Zhuiykov
DOI: https://doi.org/10.1016/j.snb.2018.01.243
2018-01-01
Abstract:Two-dimensional (2D) alpha-MoO3 nano-films with thickness of 4.9 nm were fabricated via atomic layer deposition (ALD) technique for the first time on the wafer scale and were subsequently annealed at 200 degrees C. The developed alpha-MoO3 nano-films were composed of flat nanoparticles with the average size of about 35 nm and possessed layered orthorhombic phase (alpha-MoO3). The electrochemical sensor based on these 2D alpha-MoO3 nano-films exhibited great sensitivity of 168.72 A mM(-1) cm 2 to hydrogen peroxide (H2O2) and presented extremely wide linear detection range of 0.4 M-57.6 mM with the lowest detection limit of 0.076 mu M at the signal to noise ratio of 3. Furthermore, due to extremely thin nature of 2D alpha-MoO3 nano-films ultra-fast response/recovery time of 2.0 s was achieved under the wide linear H2O2 detection range. Additionally, the sensor based on 2D alpha-MoO3 nano-films was also demonstrated great long-term stability, excellent selectivity and high reproducibility. The 2D alpha-MoO3 nano-films fabricated via ALD technique in this work represent a great opportunity for development of high-performance electrochemical sensors based on 2D transition metal oxides. (C) 2018 Elsevier B.V. All rights reserved.
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