The Principle and Application of Ellipsometery

YU Ping,ZHANG Jin-min

DOI: https://doi.org/10.3969/j.issn.1673-162x.2007.01.024

2007-01-01

Abstract:Ellipsometery is a method that utilizes the property of slight elliptical polarization of reflecting light.Spectroscopic ellipsometry is used to measure the optical parameter and thickness of film material or thick material.

What problem does this paper attempt to address?

Spectroscopic ellipsometry and its applications in the study of thin film materials

Xu-dan ZHU,Rong-jun ZHANG,Yu-xiang ZHENG,Song-you WANG,Liang-yao CHEN

DOI: https://doi.org/10.3788/CO.20191206.1195

IF: 1.1

2019-01-01

Chinese Optics

Abstract:Spectroscopic ellipsometry is used to measure the relative amplitude and phase change of linearly polarized light reflected by a material surface, so as to obtain the ellipsometric parameters. The optical properties of a material can be deduced by fitting these parameters. This technique is advantageous for being non-contact, highly sensitive, non-destructive, so it is widely used in physics, chemistry, materials science and microelectronics, etc, being an indispensable optical measurement method. This article first introduces the development history of the technology, and then presents the basic principle of the traditional ellipsometer. According to different measurement principles, ellipsometers can be divided into two types : extinction and photometric. The basic structure, measurement principle and related application of these two different types of ellipsometer are briefly clarified. After comparing these various ellipsometers, their advantages and disadvantages are introduced. At this point, a double Fourier transform infrared ellipsometry system developed by Fudan University is highlighted. Then, according to the basic steps of ellipsometric parameter manipulation, a measurement, modeling and fitting process is introduced. The equations of various optical dispersion models used for parameter fitting are introduced in detail and application examples are illustrated. Finally, the future development direction of spectroscopic ellipsometry is proposed.
The Reflecting RAP Spectroscopic Ellipsometer and Its Application

张荣君,姚明远,郑玉祥,陈良尧

DOI: https://doi.org/10.3969/j.issn.1006-7167.2010.03.010

2010-01-01

Abstract:Spectroscopy ellipsometry is a non-destructive and non-contacting measurement method,it is an important method to investigate the optical properties of materials.The history of spectroscopic ellipsometry and spectroscopic ellip-someter was introduced.The basic physical theories used in spectroscopic ellipsometry were also given.Due to the fact that most pervading spectroscopic ellipsometers used for teaching are single-wavelength extinction spectroscopic ellipsom-eters,which have low automatization and high measuring-error,a new type of spectroscopic ellipsometer of synchronous rotation analyzer and polar(RAP) was reported.After expounding the working principle and system structure,an exam-ple of its application is given.The system is simple,high integrated,of low cost,high precision and easy operation.
Research Progress of Imaging Ellipsometry

Zhang Yu,Lian Jie,Wei Mingyang,Jiang Qingfen,Wang Chenlin,Wang Yueming,Xu Zhen

DOI: https://doi.org/10.3788/lop202259.1000001

2022-01-01

Laser & Optoelectronics Progress

Abstract:Imaging ellipsometry is a measurement technology developed using traditional ellipsometry combined with imaging technology to adapt to the small and precise trends of various devices and materials. With the rapid development of nanotechnology, the technology has shown a trend of rapid developments and a wide range of applications in many fields, such as materials science, biology, and semiconductor. In this paper, we introduce the principle, advantages, and disadvantages of this technology. Furthermore, we comb the development history and describe the application progresses of this technology in material science and biomedicine, while discussing developing trends of this technology. This study hopes to serve as a review article on ellipsometric imaging technology and help promote the development of the technology and its application in more fields.
Measuring Roll Angle Displacement Based on Ellipticity with High Resolution and Large Range

Peizhe Zhang,Yicong Wang,Cuifang Kuang,Shuai Li,Xu Liu

DOI: https://doi.org/10.1016/j.optlastec.2014.06.011

2015-01-01

Abstract:A novel and compact roll angle displacement measurement based on the principle of the light's polarization is presented. The ellipticity of the light has been chosen as the final output, which shows a good linear relationship with, and a high sensitivity to, the roll angle displacement. In the experiments, a 2.16 '' step roll angle displacement has been recognized by this novel system and the linear range can be extended to 15 degrees. The major components of this system are just a half-wave plate, a quarter-wave plate, a commonly used semiconductor laser, and a detector. Therefore, it is very easy to construct such a system both in the laboratory environment and the actual measurement environment. (C) 2014 Elsevier Ltd. All rights reserved.
Analysis of Measuring Condition for Principle Angle in Spectroscopic Ellipsometry

赵海斌,夏国强,陈岳立,李晶,周仕明,陈良尧

DOI: https://doi.org/10.3321/j.issn:0253-2239.2001.06.022

2001-01-01

Abstract:The measuring condition for principle angle in spectroscopic ellipsometry is analyzed. As the incident angle is equal to principle angle θp, the phase angle of ellipsometry parameters is 90°. It gives a way to obtain θp from numerical calculation and analytic equation as the dielectric function of the material is known, and the amplitude ρp0 of ellipsometry parameters can be calculated accordingly. Higher precision of data can be acquired as measuring at incident angle of θp. The experimental results of Δp and ρp0 correspond very well with the calculated ones. The calculation formulas and methods given in this work can be applied to other spectroscopic experiments.
Application of Spectroscopic Ellipsometry and Mueller Ellipsometry to Optical Characterization

Enric Garcia-Caurel,Antonello De Martino,Jean-Paul Gaston,Li Yan

DOI: https://doi.org/10.1366/12-06883

2013-01-01

Applied Spectroscopy

Abstract:This article provides a brief overview of both established and novel ellipsometry techniques, as well as their applications. Ellipsometry is an indirect optical technique, in that information about the physical properties of a sample is obtained through modeling analysis. Standard ellipsometry is typically used to characterize optically isotropic bulk and/or layered materials. More advanced techniques such as Mueller ellipsometry, also known as polarimetry in the literature, are necessary for the complete and accurate characterization of anisotropic and/or depolarizing samples that occur in many instances, both in research and in real-life activities. In this article, we cover three main subject areas: Basic theory of polarization, standard ellipsometry, and Mueller ellipsometry. The first section is devoted to a short, pedagogical introduction of the formalisms used to describe light polarization. The second section is devoted to standard ellipsometry. The focus is on the experimental aspects, including both pros and cons of commercially available instruments. The third section is devoted to recent advances in Mueller ellipsometry. Application examples are provided in the second and third sections to illustrate how each technique works.

spectroscopy,instruments & instrumentation
Geophagy is associated with environmental enteropathy and stunting in children in rural Bangladesh.

C. George,A. Faruque,R. Sack,M. Kosek,S. Bhuyian,K. Talukder,Gwenyth O. Lee,J. Perin,Tahmina Parvin,I. Azmi,R. Haque,Shahnawaz Ahmed,S. Biswas,Lauren Oldja,S. Mohammad

DOI: https://doi.org/10.4269/ajtmh.14-0672

2015-06-03

American Journal of Tropical Medicine and Hygiene

Abstract:There is a growing body of literature indicating an association between stunting and environmental enteropathy (EE), a disorder thought to be caused by repeated exposures to enteric pathogens. To investigate the relationship between exposure to enteric pathogens through geophagy, consumption of soil, EE, and stunting, we conducted a prospective cohort study of 216 children under 5 years of age in rural Bangladesh. Geophagy was assessed at baseline using 5 hour structured observation and caregiver reports. Stool was analyzed for fecal markers of intestinal inflammation: alpha-1-antitrypsin, myeloperoxidase, neopterin (all three combined to form an EE disease activity score), and calprotectin. Eighteen percent of children had observed geophagy events by structured observation and 28% had caregiver reported events in the past week. Nearly all households had Escherichia coli (97%) in soil, and 14% had diarrheagenic E. coli. Children with caregiver-reported geophagy had significantly higher EE scores (0.72 point difference, 95% confidence interval [CI]: 0.01, 1.42) and calprotectin concentrations (237.38 μg/g, 95% CI: 12.77, 462.00). Furthermore, at the 9-month follow-up the odds of being stunted (height-for-age z-score < -2) was double for children with caregiver-reported geophagy (odds ratio [OR]: 2.27, 95% CI: 1.14, 4.51). These findings suggest that geophagy in young children may be an important unrecognized risk factor for EE and stunting.
The Rotating-Analyser-Polarizer Type Of Spectroscopic Ellipsometer

Liangyao Chen,Rongjun Zhang,Weimin Zheng,Shiming Zhou,Yuemei Yang,Yuxiang Zheng

1998-01-01

Abstract:We have designed and constructed a new type of spectroscopic ellipsometer to study the optical properties of materials in the 1.5-4.5 eV region. In design, the analyser and polarizer were driven 10(4) steps per revolution by two stepping motors having hollow shafts with a speed ratio of A = 2P. The detected light intensity has the frequencies of omega(0), 2 omega(0), 3 omega(0) and 4 omega(0). The incident angle was variable in the 30-90 degrees range. Optical constants can be obtained by calculating two sets of ac signals with data self-consistency better than 0.5%. The measured spectra of the complex dielectric function for a gold film sample showed good data consistency measured at three different incident angles at 65 degrees, 70 degrees and 75 degrees.
Metasurface array for single-shot spectroscopic ellipsometry

Shun Wen,Xinyuan Xue,Shuai Wang,Yibo Ni,Liqun Sun,Yuanmu Yang

DOI: https://doi.org/10.1038/s41377-024-01396-3

2024-04-10

Abstract:Abstract Spectroscopic ellipsometry is a potent method that is widely adopted for the measurement of thin film thickness and refractive index. Most conventional ellipsometers utilize mechanically rotating polarizers and grating-based spectrometers for spectropolarimetric detection. Here, we demonstrated a compact metasurface array-based spectroscopic ellipsometry system that allows single-shot spectropolarimetric detection and accurate determination of thin film properties without any mechanical movement. The silicon-based metasurface array with a highly anisotropic and diverse spectral response is combined with iterative optimization to reconstruct the full Stokes polarization spectrum of the light reflected by the thin film with high fidelity. Subsequently, the film thickness and refractive index can be determined by fitting the measurement results to a proper material model with high accuracy. Our approach opens up a new pathway towards a compact and robust spectroscopic ellipsometry system for the high throughput measurement of thin film properties.

optics
Ray Ellipse Method of Analyzing the Power and Polarization State of Partially Polarized Light

Liu Chao,Cen Zhao-Feng,Li Xiao-Tong,Xu Wei-Cai,Shang Hong-Bo,Neng Fen,Chen Li

DOI: https://doi.org/10.7498/aps.61.134201

IF: 0.906

2012-01-01

Acta Physica Sinica

Abstract:It is difficult to cope with the changes in power and polarization for partially polarized light. The light polarization will also affect the image quality, especially for imaging with large numerical aperture. A novel method of analyzing the power and the polarization state of partially polarized light is proposed in this paper. This method has a good intuitiveness and requires much smaller computation. An aplanatic lens system is simulated. Polarization effect caused is analyzed with this method. The results show that for the imaging light the intensity of TM polarized light relatively increases because of large numerical aperture, which will influence image contrast. Imaging in high refractive index medium can be used to improve this problem.
Quantum entanglement enabled ellipsometer for phase retardance measurement

Meng-Yu Xie,Su-Jian Niu,Yin-Hai Li,Zheng Ge,Ming-Yuan Gao,Zhao-Qi-Zhi Han,Ren-Hui Chen,Zhi-Yuan Zhou,Bao-Sen Shi

2024-02-27

Abstract:An ellipsometer is a vital precision tool used for measuring optical parameters with wide applications in many fields, including accurate measurements in film thickness, optical constants, structural profiles, etc. However, the precise measurement of photosensitive materials meets huge obstacles because of the excessive input photons, therefore the requirement of enhancing detection accuracy under low incident light intensity is an essential topic in the precision measurement. In this work, by combining a polarization-entangled photon source with a classical transmission-type ellipsometer, the quantum ellipsometer with the PSA (Polarizer-Sample-Analyzer) and the Senarmount method is constructed firstly to measure the phase retardation of the birefringent materials. The experimental results show that the accuracy can reach to nanometer scale at extremely low input intensity, and the stability are within 1% for all specimens tested with a compensator involved. Our work paves the way for precision measurement at low incident light intensity, with potential applications in measuring photosensitive materials, active-biological samples and other remote monitoring scenarios.

Quantum Physics,Optics
Accurate Analysis of Ellipsometric Data for Thick Transparent Films

Yuan Zhao,Mingyu Sheng,Yuxiang Zheng,Liangyao Chen

DOI: https://doi.org/10.3788/col201109.053101

2011-01-01

Abstract:Using e-beam evaporation, the ellipsometric parameters of thick transparent films are studied with the modified analysis method for the SiO(2) film samples deposited onto the Si substrate. The ellipsometric parameters are measured at the incidence angles changing from 50 degrees to 70 degrees and in the 3-4.5 eV photon energy range. The error in the conventional method can be significantly reduced by the modified ellipsometric method considering the spatial effect to show good agreement between the theoretical and experimental results. The new method presented in this letter can be applied to other optical measurement of the periodic or non-periodic film structures.
Development of Infrared Spectroscopic Ellipsometer by Synchronous Rotation of the Polarizer and Analyzer

ZM Huang,SR Jin,SW Chen,MH Chen,GL Shi,LY Chen,JH Chu

1998-01-01

JOURNAL OF INFRARED AND MILLIMETER WAVES

Abstract:A type of infrared spectroscopic ellipsometer was designed and constructed to study the optical properties of materials in the 2.5￣12.5μm wavelength range. The incident angle was continuously variable between 20° and 90°.The system operations, including data acquisition and reduction, preamplifier gain control, incident angle, wavelength setting and scanning were fully and automatically controlled by a computer. The reflectivity of Au and refractive index of GaAs bulk material, measured by the infrared ellipsometer, were given as an example, and a comparison of the results with other methods was also given. The experimental skill and main system errors were discussed.
Improved Rotating Analyser-Polarizer Type of Scanning Ellipsometer

LY CHEN,XW FENG,Y SU,HZ MA,YH QIAN

DOI: https://doi.org/10.1016/0040-6090(93)90291-v

IF: 2.1

1993-01-01

Thin Solid Films

Abstract:A new type of spectroscopic ellipsometer in which the analyser and polarizer rotate synchronously has been designed and constructed. For the system, the analyser and polarizer were driven 104 steps per revolution by two stepping motors with a speed ratio of 2:1. A second polarizer was placed in the optical path to eliminate the source polarization effect. The light intensity thus contains four a.c. components, having frequencies of ω0, 2ω0, 3ω0 and 4ω0. The ellipsometric parameters ψ and Δ, as well as the optical constants, can be independently obtained by calculating any one of the two sets of a.c. signals. The system was self-calibrated, and was fully and automatically controlled by a 386-based microcomputer. The results of measured spectra of the complex refractive index for a 3000 Å thick Au film sample are given. An equation for calculating directly the principal angle to obtain the highest precision of the optical constants is presented.
Improved Full-Field Rotating Analyzer Ellipsometry Method for Ultrathin Film Characterization

Fangfang Meng,Yan Li,Xuejian Wu,Kun Chen,Haoyun Wei,Xin Wang

DOI: https://doi.org/10.1117/1.oe.54.8.084108

IF: 1.3

2015-01-01

Optical Engineering

Abstract:We describe an improved approach for accurately characterizing the thickness distribution of ultrathin films by using full-field rotating analyzer ellipsometry. The significant improvements originate from the combination of angle optimization and error compensation. Angle optimization is achieved by fixing the polarizer and the quarter wave plate (QWP) at the averaged values of a series of optimal angles, which correspond to a certain thickness range of the sample. At the same time, error compensation further improves the accuracy by determining and removing the nonuniform impact of the QWP. To verify the applicability of the proposed method, experiments based on varied ultrathin films are implemented and compared with the results of two conventional methods. The results from the proposed method are in accord with those obtained using commercial instrument and the design value in thermal evaporation system. Further investigation shows that the uncertainties of the ellipsometric angles, both Psi and Delta, are less than 0.045 deg, with a lateral resolution of 4.65 mu m. Because of its improved accuracy, this method offers a feasible route for characterizing film thickness, especially in the case of monitoring the growth of thin layers from a bare substrate or following changes in the sample parameters during a kinetic process. (C) 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)
Dynamic ellipsometry measurement based on a simplified phase-stable dual-comb system.

Ruixue Zhang,Liheng Shi,Siyu Zhou,Jinxu Zhang,Bin Liu,Guanhao Wu

DOI: https://doi.org/10.1364/OE.453406

IF: 3.8

2022-01-01

Optics Express

Abstract:Spectroscopic ellipsometry is a powerful tool for characterizing thin film, polarization optics, semiconductors, and others. Conventional approaches are subject to restrictions of mechanical instability and measurement speed. The complex locking scheme of previous dual-comb spectroscopic ellipsometry belies its practicability. We present and demonstrate here dynamic spectroscopic ellipsometry based on a simplified phase-stable dual-comb system, which could realize the online dynamic measurement of optical properties of materials. A precision of 1.31 nm and a combined uncertainty of 13.80 nm (k = 2) in the thickness measurement of thin-film samples has been achieved. Moreover, the dynamic performance of the system is investigated under a high data acquisition rate (1 kHz) with a dynamic resolution of ellipsometric parameter better than 0.1 rad.
Analytic ellipsometric measurement for materials under bulk encapsulation

Shuying Chen,Hanyu Fu,Chengwen Yang,Yi Zhang,Yan Song,Lin Zhou

DOI: https://doi.org/10.1364/oe.523928

IF: 3.8

2024-05-04

Optics Express

Abstract:Shuying Chen, Hanyu Fu, Chengwen Yang, Yi Zhang, Yan Song, Lin Zhou Accurate measurement of the dielectric functions of emerging optical materials is of great importance for advancements in solid-state ... [Opt. Express 32, 18293-18300 (2024)]

optics
The Study of A Auto Ellipsometer System by Using A Two-Dimensional Ccd Array Detector

HY You,JH Jia,JK Chen,T Han,WM Ni,SY Wang,J Li,YM Yang,LY Chen

2003-01-01

JOURNAL OF INFRARED AND MILLIMETER WAVES

Abstract:A new type of CCD ellipsometer was designed and constructed to study the optical properties of materials in 5000 similar to 10000 angstrom wavelength range. In the system, the polarizer are driven by a stepping motor that have hollow shafts. The traditional spectroscopic monochromator and photomultiplier were replace by a two-dimensional Si-Based CCD array detector and an integrated grating consisting of three sub-gratings to avoid mechanical transmission, vibration problems and scanning grating entirely. It makes the system simple and reliable, and shorten the time of measurement greatly. The system adopted the technique of arranging CCD Spectrometer at the back. Thus, a series of problems were investigated and solved including the optical principle, instrument design, system calibration, spectra measurement and data analysis. The results from the measured spectra of the complex refractive index for a gold-film sample are presented. It well agrees with the value based on the Drude theory.
A fully automatized method for the unambiguous wavelength-by-wavelength determination of the thickness and optical property of a very thin film with a transparent range

Florian Maudet,Charlotte Van Dijck,Muhammad Hamid Raza,Catherine Dubourdieu

DOI: https://doi.org/10.1063/5.0150135

2023-03-13

Abstract:Spectroscopic ellipsometry is a powerful method with high surface sensitivity that can be used to monitor the growth of even sub-monolayer film. However, the analysis of ultrathin films is complicated by the correlation of the dielectric constant and the thickness. This problem is usually resolved by fixing one or the other value, limiting the information that can be extracted. Here, we propose a method to determine unambiguously the refractive index, extinction coefficient and thickness of a film when a transparent range is available in the energy range investigated. We decompose the analysis in three steps. First, the thickness of the film is determined from the transparent range of the film. Then, knowing the thickness of the layer, an initial estimation of the refractive index and extinction coefficient is made based on a first-order Taylor expansion of the ellipsometric ratio. Finally, using this estimation, a numerical regression is done to ensure the convergence of the fit towards the solution. A theoretical example of the method is given for two different thicknesses of TiO2 films. Finally, the method is applied to the experimental data measured during the atomic layer deposition of a thin film of Hf0.5Zr0.5O2 grown on Si. The thickness, refractive index and extinction coefficient are retrieved with a high precision in the energy range of 3.5 - 6.5 eV. A detailed analysis is presented on the accuracy of the retrieved values and their dependency on random and systematic errors for different energy ranges.

Optics

The Principle and Application of Ellipsometery

Spectroscopic ellipsometry and its applications in the study of thin film materials

The Reflecting RAP Spectroscopic Ellipsometer and Its Application

Research Progress of Imaging Ellipsometry

Measuring Roll Angle Displacement Based on Ellipticity with High Resolution and Large Range

Analysis of Measuring Condition for Principle Angle in Spectroscopic Ellipsometry

Application of Spectroscopic Ellipsometry and Mueller Ellipsometry to Optical Characterization

Geophagy is associated with environmental enteropathy and stunting in children in rural Bangladesh.

The Rotating-Analyser-Polarizer Type Of Spectroscopic Ellipsometer

Metasurface array for single-shot spectroscopic ellipsometry

Ray Ellipse Method of Analyzing the Power and Polarization State of Partially Polarized Light

Quantum entanglement enabled ellipsometer for phase retardance measurement

Accurate Analysis of Ellipsometric Data for Thick Transparent Films

Development of Infrared Spectroscopic Ellipsometer by Synchronous Rotation of the Polarizer and Analyzer

Improved Rotating Analyser-Polarizer Type of Scanning Ellipsometer

Improved Full-Field Rotating Analyzer Ellipsometry Method for Ultrathin Film Characterization

Dynamic ellipsometry measurement based on a simplified phase-stable dual-comb system.

Analytic ellipsometric measurement for materials under bulk encapsulation

The Study of A Auto Ellipsometer System by Using A Two-Dimensional Ccd Array Detector

A fully automatized method for the unambiguous wavelength-by-wavelength determination of the thickness and optical property of a very thin film with a transparent range