Research on the Design Specifications of the Driving Motor in the Magnet-Assisted Monolithic Reticle Stage

Fan Zhi,Ming Zhang,Yu Zhu,Jing Wang
DOI: https://doi.org/10.12783/dtetr/mdm2016/4941
2016-01-01
Abstract:Photolithography system is a key equipment for semiconductor manufacturers and requires both significant positioning precision and high demand of production rate. Novel reticle stages which utilizes permanent magnetic motors for its acceleration and deceleration have the great advantage in reducing the heat generation and thus can promise the precision. However, the driver noise injected in the driving motor and the force ripples still deteriorate the performance, and it is essential to constrain their effects. In this paper, the relationship between the precision of reticle stage and the force-weight ratio as well as the force ripples is studied, and the design specifications for these two design factors are determined via the method of dynamic error budget. This approach is then used in the design of the driving motor in the magnet-assisted monolithic reticle stage to validate its effectiveness.
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