Abstract:The guiding pattern in the chemoepitaxially directed self-assembly (DSA) of block copolymers is often fabricated by periodically functionalizing homogeneously random copolymer brushes tethered on a substrate. The prepatterned copolymer brushes constitute a soft penetrable surface, and their two components can in principle locally segregate in response to the overlying self-assembly process of block copolymers. To reveal how the self-responsive behavior of the copolymer brushes affects the directing effect, we develop a dissipative particle dynamics model to explicitly include the prepatterned polymer brushes and implement it to simulate the DSA of a cylinder-forming diblock copolymer melt on the sparse pattern of polymer brushes. Through large-scale dynamic simulations, we identify the windows of the content of the random copolymer, the film thickness, and the diameter of the patterned spot, for the formation of perfectly ordered hexagonal patterns composed of perpendicular cylinders. Our dynamic simulations reveal that the random copolymer brushes grafted on the unpatterned area exhibit a remarkable self-responsive ability with respect to the self-assembly of the diblock copolymers overlying them, which may widen the effective window of the content of the random copolymer. Within the processing windows of these key parameters, defect-free patterns are successfully achieved both in simulations and in experiments with sizes as large as a few micrometers for 4-fold density multiplications. This work demonstrates that highly efficient computer simulations based on an effective model can provide helpful guidance for experiments to optimize the critical parameters and even may promote the application of DSA.

Directed Self-Assembly Structure of a Diblock Copolymer with Homopolymer-Grafted Particles

Directed Self-Assembly of Hierarchical Supramolecular Block Copolymer Thin Films on Chemical Patterns

Ordered Structures Of Diblock Nanorods Induced By Diblock Copolymers

Surface-field-induced Microstructures of Asymmetric Diblock Copolymer Nanoparticles

Directed Self-Assembly of Ternary Blends of Block Copolymer and Homopolymers on Chemical Patterns

Self-assembly of Rod-Shaped Particles in Diblock-Copolymer Templates.

Dissipative Particle Dynamics Simulation on the Self-Assembly of Linear Abc Triblock Copolymers under Rigid Spherical Confinements

Directed Self-Assembly by Sparsely Prepatterned Substrates with Self-Responsive Polymer Brushes.

Ordered Nanostructures Self-Assembled from Block Copolymer Tethered Nanoparticles

Self-assembly and Structural Manipulation of Diblock-Copolymer Grafted Nanoparticles in a Homopolymer Matrix

Position Transitions of Polymer-Grafted Nanoparticles in Diblock-Copolymer Nanocomposites

Directed self-assembly of block copolymers on sparsely nanopatterned substrates

Ordering Mechanism of Asymmetric Diblock Copolymers Confined Between Polymer-Grafted Surfaces

Confined co-assembly of AB/BC diblock copolymer blends under 3D soft confinement.

Self-Assembly of Rod−Coil−Rod Triblock Copolymer and Homopolymer Blends

Exploring Microstructures and Interphase Properties of Surface- Grafted Diblock Copolymers in a Homopolymer Melt by Self-Consistent Field Theory Simulations

Crosslinking Modulated Hierarchical Self-Assembly of Rod–Coil Diblock Copolymer Patchy Nanoparticles

Hierarchical Nanostructures Self-Assembled from Diblock Copolymer/homopolymer Blends with Supramolecular Interactions.

Self-assembled nanostructures of homopolymer and diblock copolymer blends in a selective solvent.

Self-assembly of Diblock Copolymer Confined in an Array-Structure Space.

The Process-Directed Self-Assembly of Block Copolymer Particles