Low Onset Potential on Single Crystal Ta3N5 Polyhedron Array Photoanode with Preferential Exposure of {001} Facets

Zhan Shi,Jianyong Feng,Hao Shan,Xin Wang,Zhe Xu,Huiting Huang,Qinfeng Qian,Shicheng Yan,Zhigang Zou
DOI: https://doi.org/10.1016/j.apcatb.2018.06.037
2018-01-01
Abstract:The photoelectrochemical performance of photoanode depends significantly on the surface properties. Enormous efforts have been spent on fabricating photoanode with exposure of high-activity facets. However, precise control of the Ta3N5 facet exposure is still highly challenging, due to its harsh fabrication condition. In this study, it was found that Ta3N5 polyhedron can be grew through a bottom-up growth process in molten salt. Molten salt media in a semi-closed reactor provides a steady growth environment so that the Ta3N5 growth units are able to assemble in thermodynamically and kinetically favorable way. The preferential exposed facets are determined to be {001} facets. Due to the stronger built-in electric field on {001} facets and the small effective mass of hole along the [001] axis, an onset potential of 0.6 V versus reversible hydrogen electrode (RHE) and a photocurrent of 5.6 mA cm(-2) at 1.23 versus RHE have been achieved. Our findings may open an avenue to grow the nitride or oxynitride semiconductor crystals with desired structures for achieving efficient solar energy conversion and storage.
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