Abstract:With the continuous development of the field of information technology, there has been a demand for recording mark size of optical data storage, optical imaging resolving power, and characteristic linewidth of photolithography to reach nanoscale. However, it is very difficult to realize the goal due to the optical diffraction limit restrictions. Much interest has focused on the study of optical far-field super-resolution spot by using pupil filters. However, common concerns have continued to plague super-resolving pupil filters based on either scalar diffraction theory or vector diffraction theory. These concerns include the fact that the side lobe becomes non-negligible when the central lobe is squeezed to a certain extent. Moreover, it is difficult to reduce the super-resolving spot to nanoscale. In this work, we proposed a novel method to combine the super-resolving pupil filters with nonlinear saturable absorption thin films to reduce the central spot size to nanoscale, lower the intensity ratio of side lobe to central lobe, and elongate the depth of focus or tunable tolerance distance between the super-resolving spot and sample. The simulated results indicate that by using the three-zone annular binary phase filter as the super-resolving pupil filter and Sb2Te3 as the nonlinear saturable absorption thin films, the central spot size can be reduced to nanoscale, the side lobe intensity is squeezed to about 10% of the central lobe intensity, and the tunable tolerance distance between the super-resolving spot and the sample is about two times that of the depth of focus of the diffraction limited spot at the incident laser wavelength of 405nm and the numerical aperture of focusing lens of 0.95. The combination of the super-resolving pupil filters with the nonlinear saturable absorption thin films is very useful for nano-optical data storage, maskless nanolithography, and nano-optical imaging. It is also easy to use in actual applications because of the operation in the far-field range.

Adaptive Optics Scanning System with Two-Zone Phase Filters

Resolution enhancement of confocal scanning microscopy using low-intensity imaging part of point spread function

Enhancing the Axial Resolution of Two-Photon Imaging.

Modulated Pattern Scanning Microscopy

High-accuracy Differential Autofocus System with an Electrically Tunable Lens.

Optimization for Imaging Through Scattering Media for Confocal Microscopes with Divided Elliptical Apertures.

Optimization of Transverse Translation Diverse Phase Retrieval for Optical Elements with Mid-Spatial Frequency Errors

Research on Design of Optimum Phase Mask for Wave-Front Coded Imaging System

A Highly Efficient Superresolving Phase Filter for a Radially Polarized Beam

The design of wavefront coded imaging system

Single-shot Wavefront Sensing with Nonlocal Thin Film Optical Filters

Study on Improvement of Resolution in Photolithographic Patterns with Pupil Phase-Shift Filtering

The Design and Experiments of the Super-Resolving Annular Binary Filters Based on Genetic Algorithm

A Programmable Optical Filter with Arbitrary Transmittance for Fast Spectroscopic Imaging and Spectral Data Post-Processing.

Performance improvement of super-resolving pupil filters via combination with nonlinear saturable absorption films

Improved Chromatic Confocal Displacement-Sensor Based on a Spatial-Bandpass-filter and an X-shaped Fiber-Coupler.

Axial Superresolution by Phase Filter in Optical Coherence Tomography

Advanced Optical Design for Biochip Scanning System

Optimized Design of Four-Zone Phase Pupil Filter for Nanoscale Phase Transition Optical Lithography

The Correction Method for Wavefront Aberration Caused by Spectrum-Splitting Filters in Multi-Modal Optical Imaging System

Study of Improvement of Imaging Quality in Project Photolithography with Amplitude Phase Compound Filtering