Near-UV-enhanced sensitivity of plasmonic metasurface device for volatile organic sensing

Yu-Sheng Lin
DOI: https://doi.org/10.1109/CLEOPR.2017.8118634
2017-01-01
Abstract:A volatile organic solutions (VOS) sensor with plasmonic metasurface is proposed and demonstrated in the near-UV wavelength range. The plasmonic metasurface device (PMD) is composed of the hybrid of metal/dielectric/semiconductor nanostructures. These nanostructures are fabricated by using natural lithography technique for wafer-level fabrication, which hybridized resonances could enhance electromagnetic field confinement of the reflected light to arouse a significant resonance narrowing. The experiment results indicate the sensitivity and figure-of-merit of PMD are 68.6 nm/RIU and 3.5, respectively. It exhibits the light-matter interactions overcoming the diffraction limit, enabling the chemical solutions sensing applications in the near-UV wavelength range. The proposed PMD can be exploited to further increase the detection and potentially enter the ultra-strong UV coupling region in chemical solution sensors.
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