Abstract:Nanofabrication technology with high-resolution, high-throughput and low-cost is essential for the development of nanoplasmonic and nanophotonic devices. At present, most metasurfaces are fabricated in a point by point writing manner with electron beam lithography or a focused ion beam, which imposes a serious cost barrier with respect to practical applications. Near field optical lithography, seemingly providing a high-resolution and low-cost way, however, suffers from the ultra shallow depth and poor fidelity of obtained photoresist patterns due to the exponential decay feature of evanescent waves. Here, we propose a method of surface plasmonic imaging lithography by introducing a reflective plasmonic lens to amplify and compensate evanescent waves, resulting in the production of nano resist patterns with high fidelity, contrast and enhanced depth beyond that usually obtained by near field optical lithography. As examples, a discrete and anisotropically arrayed nano-slots mask pattern with different orientations and a size of 40 nm × 120 nm could be imaged in photoresist and transferred successfully onto a metal layer through an etching process. Evidence for the pattern quality is given by virtue of the fabricated metasurface lens devices showing good focusing performance in experiments. It is believed that this method provides a parallel, low-cost, high-throughput and large-area nanofabrication route for fabricating nanostructures of holograms, vortex phase plates, bio-sensors and solar cells etc.

Holography: Batch Fabrication of Metasurface Holograms Enabled by Plasmonic Cavity Lithography (advanced Optical Materials 21/2017)

Batch Fabrication of Metasurface Holograms Enabled by Plasmonic Cavity Lithography

Hybrid Bilayer Plasmonic Metasurface Efficiently Manipulates Visible Light

Precisely Constructing Hybrid Nanogap Arrays Via Wet-Transfer of Dielectric Metasurfaces Onto a Plasmonic Mirror.

Fabrication of Anisotropically Arrayed Nano-Slots Metasurfaces Using Reflective Plasmonic Lithography.

Metasurface-based Broadband Hologram with High Tolerance to Fabrication Errors

Broadband Multiplane Holography Based on Plasmonic Metasurface

Three-dimensional optical holography using a plasmonic metasurface

Reflective Plasmonic Metasurface and Metahologram

Fabrication of Plasmonic Cavity and Indefinite Metamaterial by Laser-Induced Forward Transfer

Facile metagrating holograms with broadband and extreme angle tolerance

Metasurface for three-dimensional optical holography

Ultra-broadband Metasurface Holography Via Quasi-Continuous Nano-Slits

High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens

Vectorial holography-mediated growth of plasmonic metasurfaces

Facile Fabrication of THz Metasurfaces by a Spatially Shaped Femtosecond Laser Printing System

Broadband Plasmonic Metasurface for Spin-Selective Hologram in Near-Infrared Band

High-fidelity fabrication of plasmonic nanoholes array via ion-beam planarization for extraordinary transmission applications

Plasmonic Interference Lithography by Coupling the Bulk Plasmon Polariton Mode and the Waveguide Mode

High-efficiency generation of vectorial holograms with metasurfaces

Polarization-independent Broadband Meta-Holograms Via Polarization-Dependent Nanoholes