Abstract:Inductively coupled plasmais widely used in semiconductor and display process because of its desirable characteristics such as high plasma density, simple structure and independently controllable ion energy. The driving frequency is a significant parameter that generates and maintains the plasma. However, the effects of different driving frequencies on the radial distribution of the plasma parameters are hardly investigated. So a large area cylindrical inductively coupled plasma source driven separately by 2 MHz and 13.56 MHz is investigated. In order to perform a comprehensive investigation about the effect of driving frequency, the radially resolved measurements of electron density, electron temperature and density of metastable state atoms for the argon discharge are systematically analyzed by Langmuir double probe and optical emission spectroscopy at various power values and gas pressures. It is found that input power values at high frequency (13.56 MHz) and low frequency (2 MHz) have different effects on plasma parameters. When discharge is driven at high frequency, the electron density increases obviously with the increase of power. However, when discharge is driven at low frequency, the electron temperature increases evidently with the increase of power. This can be explained by calculating the skin depths in high and low frequency discharge. When the discharge is driven at high frequency, the induced electromagnetic field is higher than that at low frequency, and the single electron obtains more energy. It is easier to ionize, so the energy is mainly used to increase the electron density. When the discharge is driven at low frequency, the skin layer is thicker, the number of heated electrons is larger, and the average energy of electrons is increased, so the energy is mainly used to raise the electron temperature. At a gas pressure of 10 Pa, the electron density shows a 'convex' distribution and increases with the increase of input power for both the high-frequency and low-frequency discharge. While the distributions of electron temperature are obviously different. When the discharge is driven at high frequency, the electron temperature is relatively flat in the center of the chamber and slightly increases on the edge. When the discharge is driven at low frequency, the electron temperature gradually decreases along the radial position. This is due to the one-step ionization in the high-frequency discharge and the two-step ionization in the low-frequency discharge. In order to prove that the low-frequency discharge is dominated by two-step ionization, the spectral intensities of the argon plasma under the same discharge conditions are diagnosed by optical emission spectroscopy. The number density of metastable states is calculated by the branch ratio method. The results are consistent with the analyses. At a gas pressure of 100 Pa, the electron density increases and then decreases with the increase of radial distance, and the overall distribution shows a " saddle shape" for high frequency and also for low frequency discharge. Although the uniformity of electron density improves with the gas pressure, the uniformity at low frequency is better than that at high frequency. The reason can be attributed to the fact that the skin layer of low frequency is thicker and the heating area is wider.

Experimental Investigation of Standing Wave Effect in Dual-Frequency Capacitively Coupled Argon Discharges: Role of a Low-Frequency Source

Simulation of nonlinear standing wave excitation in very-high-frequency asymmetric capacitive discharges: roles of radial plasma density profile and rf power

Experimental Observation of Standing Wave Effect in Low-Pressure Very-High-Frequency Capacitive Discharges

Experimental investigation of the electromagnetic effect and improvement of the plasma radial uniformity in a large-area, very-high frequency capacitive argon discharge

Experimental Investigations of the Plasma Radial Uniformity in Single and Dual Frequency Capacitively Coupled Argon Discharges

Effects of low-frequency voltage on nonlinear standing wave excitation, plasma uniformity, and ion dynamics in dual-frequency asymmetric capacitive discharges

Experimental observation of standing wave effect in low-pressure 200 MHz capacitive discharges

Low-frequency Dependence of Plasma Characteristics in Dual-Frequency Capacitively Coupled Plasma Sources

Experimental Investigation of Nonlinear Standing Waves in DC/VHF Hybrid Capacitive Discharges

Phase-shift Effect in Capacitively Coupled Plasmas with Two Radio Frequency or Very High Frequency Sources

Experimental diagnostics of plasma radial uniformity and comparisons with computational simulations in capacitive discharges

Role of gas composition in weakened nonlinear standing wave excitation and improved plasma radial uniformity in very-high-frequency asymmetric capacitive Ar/CF4 discharges

Experimental study of spatial non-uniformities in a dual frequency capacitively coupled plasma

Experimental Investigation of Plasma Parameters in 13.56 MHz/2 MHz Cylindrical Inductively Coupled Plasma

Influence of dual-frequency source powers on ion density and electron temperature in capacitively-coupled argon plasma

Modulating Effects of the Low-Frequency Source on Ion Energy Distributions in A Dual Frequency Capacitively Coupled Plasma

Suppression of Nonlinear Standing Wave Excitation Via the Electrical Asymmetry Effect

Nonlinear Series Resonance and Standing Waves in Dual-Frequency Capacitive Discharges

Nonlinear Harmonic Excitations in Collisional, Asymmetrically-Driven Capacitive Discharges

Experimental and Numerical Investigations of the Phase-Shift Effect in Capacitively Coupled Discharges

Experimental Investigations of Electron Density and Ion Energy Distributions in Dual-Frequency Capacitively Coupled Plasmas for Ar/Cf4 and Ar/O-2/Cf4 Discharges