Three Indazole Derivatives As Corrosion Inhibitors of Copper in a Neutral Chloride Solution

Yujie Qiang,Shengtao Zhang,Song Yan,Xuefeng Zou,Shijin Chen
DOI: https://doi.org/10.1016/j.corsci.2017.07.012
IF: 7.72
2017-01-01
Corrosion Science
Abstract:In this work, three halogeno-indazole compounds were investigated for corrosion inhibition of copper in 3.0 wt % NaCl solution using potentiodynamic polarization measurement, electrochemical impedance spectroscopy, and X-ray diffraction (XRD) analysis. The electrochemical results revealed that all of these organics are mixed type inhibitors with an inhibitive ability order: 4-CIA > 4-BIA > 4-FIA, which was further confirmed by observations with field emission scanning electron microscope (FE-SEM) and atomic force microscope (AFM). Their favourable performance is ascribed to the formation of inhibitor-adsorption films on copper. Furthermore, theoretical calculations showed the electronic structure of studied compounds and their optimized adsorption configurations on the copper surface.
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